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Accelerating Surface Particle Contamination Control by Combining Fastmicro and Phenom Technologies

About this event

Surface particle contamination remains a critical challenge across advanced manufacturing industries, where particles can negatively impact yield, product quality, and process reliability. Effective contamination control requires both rapid surface particle quantification and deeper particle characterization capabilities to support root-cause analysis and process improvement.

In this webinar, Nanoscience Instruments and Fastmicro will introduce their new partnership and discuss how the complementary nature of Fastmicro and Phenom technologies can help customers improve technical cleanliness workflows and contamination-control strategies.

We begin by highlighting the ease of use of the Phenom desktop SEM platform for particle characterization. The Phenom enables users to move efficiently from sample loading and navigation to high-resolution SEM imaging, particle morphology analysis, and elemental characterization via EDS. This makes the platform well suited for laboratories that require reliable particle analysis without the complexity of traditional SEM workflows.

Fastmicro will then introduce its surface particle inspection solutions, including the Sample Scanner platform for rapid and repeatable quantification of surface particle contamination on critical parts and surfaces. The webinar will also introduce the concept of a Fastmicro–Phenom workflow, combining high-speed particle detection and localization with targeted SEM-EDS particle characterization on the Phenom platform.

By combining rapid surface particle screening with targeted SEM-EDS follow-up analysis, the workflow concept aims to significantly reduce particle root-cause analysis time compared to conventional SEM-based search workflows. Instead of manually searching for particles of interest, users can rapidly identify, localize, and prioritize particles for detailed morphology and composition analysis, enabling faster contamination investigations and more efficient process optimization.

The session will include:

  • Introduction to Fastmicro and its surface particle inspection technologies
  • Overview of the Phenom platform for particle characterization
  • Introduction to the Fastmicro–Phenom workflow concept
  • Example applications in technical cleanliness and contamination control
  • Discussion of how complementary Fastmicro and Phenom capabilities can support existing Phenom users

The webinar is intended as an introduction to the partnership and workflow concept, and attendees interested in exploring specific applications or workflows will be invited for further in-depth discussions afterward.

Hosted by

  • External speaker
    E
    Hans Arts USA Technical Account Manager @ Fastmicro

    Hans Arts is the USA Technical Account Manager at Fastmicro, a company specializing in high-throughput surface particle inspection solutions that help leading manufacturers improve contamination control, manufacturing yield, and product quality. At Fastmicro, Hans supports customers across the U.S. in implementing surface particle inspection workflows and developing contamination-control strategies for advanced manufacturing environments. With more than 10 years of experience in the global high-tech manufacturing industry, Hans has collaborated with leading companies on particle inspection and contamination-control applications. He studied Industrial Engineering and actively contributes within SEMI and IEST industry working groups focused on contamination control, inspection technologies, and technical cleanliness.

  • Team member
    MS T
    Michael Stoller
  • Team member
    T
    Isabella Germinario Scientific Marketing & Communications @ Nanoscience Instruments

Nanoscience Instruments

Serving the nano-World

Nanoscience Instruments combines expertise in microscopy and surface science instrumentation with real-world solutions. We partner with innovative instrument manufacturers around the world to help scientists and engineers solve complex problems leading to break-through innovations.